AX-7670-0190-47768-AMAT-HDP-CVD 反应气体发生器

ASTRON⑧i反应气体发生器专为提高流动能力和工艺灵活性而设计。ASTRONi反 应气体发生器消除了加工过程中对氩气的需求,允许选择与现有工艺气体兼容的点火气体,并增加了总体流量,减少了加工时间,提高了吞吐量。

ASTRONi反应气体发生器基于专利的低场环形等离子体技术,可提供更大范围的工作压力,同时保持较高的输入气体解离率。可靠性、经过现场的设计架构结合了电源、控制模块和等离子体室。其结果是一个紧凑的, 盖子安装的单位, 这是很容易集成。

Category:
  • 购买咨询热线/Phone:18859254943
  • 邮箱/Email:sales@ygdcs.com
  • 地址:成都高新区天益街北巷52号附14号2层

Description

AX-7670-0190-47768-AMAT-HDP-CVD 反应气体发生器

ASTRON⑧i反应气体发生器专为提高流动能力和工艺灵活性而设计。ASTRONi反 应气体发生器消除了加工过程中对氩气的需求,允许选择与现有工艺气体兼容的点火气体,并增加了总体流量,减少了加工时间,提高了吞吐量。

ASTRONi反应气体发生器基于专利的低场环形等离子体技术,可提供更大范围的工作压力,同时保持较高的输入气体解离率。可靠性、经过现场的设计架构结合了电源、控制模块和等离子体室。其结果是一个紧凑的, 盖子安装的单位, 这是很容易集成。

ASTRONi反应气体发生器的主要应用是作为反应气体的远程源,用于清除CVD或FPD工艺室内壁上不需要的沉积物,这些工艺室需要更大的工艺灵活性。通过产生氟原子,与室内的废物沉积发生反应,形成新的气体,这些气体很容易被洗涤,以尽量减少对环境的影响。此外,与原位射频方法相比,远程源减少了对工艺室的磨损。
●操作过程中不需要氩气
●增加流量减少腔室清洁时间
●连续运行(CW),不受占空比限制,支持大型腔室和/或长时间清洁
兼容200mm和300mm腔室
选择点火气体的灵活性和较低的CoO
●紧凑,盖子安装设计,便于集成
●在宽压力范围内的高解离率,更强大的操作与室清洁硬件配置

AX-7670-0190-47768-AMAT-HDP-CVD 反应气体发生器

The ASTRON⑧i reaction gas generator is designed for increased flow capacity and process flexibility. The ASTRONi reaction gas generator eliminates the need for argon during processing, allows the selection of ignition gases compatible with existing process gases, and increases overall flow, reduces processing time, and improves throughput.

The ASTRONi reaction gas generator is based on patented low-field torus plasma technology that provides a wider range of operating pressures while maintaining a high input gas dissociation rate. The reliable, field-tested design architecture combines power, control modules and plasma chambers. The result is a compact, lid-mounted unit, which is easy to integrate.

The main application of the ASTRONi reaction gas generator is as a remote source of reaction gases for removing unwanted deposits from the walls of CVD or FPD process chambers that require greater process flexibility. By producing fluorine atoms, they react with waste deposits in the room to form new gases that can be easily washed to minimize environmental impact. In addition, the remote source reduces wear on the process chamber compared to the in-situ RF method.
● Argon is not required during operation
● Increased flow reduces chamber cleaning time
Continuous operation (CW), free of duty cycle restrictions, supports large chambers and/or long cleaning periods
Compatible with 200mm and 300mm chambers
Flexibility in selecting ignition gas and lower CoO
● Compact, lid mounting design, easy to integrate
High dissociation rate over a wide pressure range, more powerful operation with room cleaning hardware configuration

 

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  • 购买咨询热线/Phone:18859254943
  • 邮箱/Email:sales@ygdcs.com
  • 地址:成都高新区天益街北巷52号附14号2层