STP-A2203CS 磁悬浮涡轮分子泵

Description

STP-A2203CS 磁悬浮涡轮分子泵

Advanced 高处理能力系列
Advanced 系列可提供高水平的处理能力，非常适合您的半导体蚀刻和 CVD 制程：

占用空间小
处理速度介于 300 l/s 至 4500 l/s 之间
处理能力高达 6 slm，并提高了 H2、N2 和 Ar 性能

这种多合一的涡轮泵解决方案消除了传统机器所需的连接电缆和机架：

减少了占地面积，可节省宝贵的厂房面积、安装时间和成本
板上电源在高气体流量下将能耗降低达 32％
以 300 l/s 至 4500 l/s 的处理速度运行

STP-A2203CS

STP-A2203CS 磁悬浮涡轮分子泵

Advanced High processing capability series
The Advanced series offers a high level of processing power, ideal for your semiconductor etching and CVD processes:

Small footprint
The processing speed is between 300 l/s and 4500 l/s
Processing capacity up to 6 slm and improved H2, N2 and Ar performance

This all-in-one turbopump solution eliminates the connection cables and racks required for traditional machines:

Reduced footprint saves valuable plant space, installation time and costs
On-board power supplies reduce energy consumption by up to 32% at high gas flows
Operating at processing speeds of 300 l/s to 4500 l/s